Bulk & sleeving of patterns for time writing optimisation
Fracturing of periodic layouts for photonic crystals
Designing Fresnel zone plates using formulas in BEAMER
SÜSS-MicroOptics Source Mask Optimisation
LAB simulation methods and Optical Proximity Correction in Lithography
Multipass Techniques
3D E-beam lithography
Using TRACER to Estimate the Base-Dose for Different Substrates
Filling arbitrary shapes with tilted gratings
Laser Grayscale Lithography
Dose Assignments for Exposures on Thin Membranes
Exposure Strategies for Optimised Writing
Influence of Shape PEC on Resist Profile
Projection Simulation Example
Managing PEC Data Volume to Improve Throughput
Pattern replacement and filtering for post processing
Optimisation of relative dose exposure for critical features
Loops, Variables and Functions
Using Loop module in BEAMER
Exposure dose for targets and large areas
3D Correction for Dolan Technique
